Yuichiro Mitani

11 papers Journal 4Unranked 7
YearRankTypeTitle / Venue / Authors
2025 — conf
Re-Consideration of Correlation Between Interface States and Bulk Traps Using Cryogenic Measurement.
ASP-DAC
Yuichiro Mitani, Tatsuya Suzuki, Yohei Miyaki
2024 — conf
Re-consideration of Correlation between Interface and Bulk Trap Generations using Cryogenic Measurement.
IRPS
Yuichiro Mitani, Tatsuya Suzuki, Yohei Miyaki
2020 — conf
Further Investigation on Mechanism of Trap Level Modulation in Silicon Nitride Films by Fluorine Incorporation.
IRPS
Harumi Seki, Yasushi Nakasaki, Yuichiro Mitani
2018 — conf
Study on mechanism of thermal curing in ultra-thin gate dielectrics.
IRPS
Yuichiro Mitani, Yusuke Higashi, Yasushi Nakasaki
2017 J jnl
Error Tolerance Analysis of Deep Learning Hardware Using a Restricted Boltzmann Machine Toward Low-Power Memory Implementation.
IEEE Trans. Circuits Syst. II Express Briefs
Takao Marukame, Kodai Ueyoshi, Tetsuya Asai, Masato Motomura, Alexandre Schmid, Masamichi Suzuki, Yusuke Higashi, Yuichiro Mitani
2017 J jnl
Mechanism of gate dielectric degradation by hydrogen migration from the cathode interface.
Microelectron. Reliab.
Yusuke Higashi, Riichiro Takaishi, Koichi Kato, Masamichi Suzuki, Yasushi Nakasaki, Mitsuhiro Tomita, Yuichiro Mitani, Masuaki Matsumoto, Shohei Ogura, Katsuyuki Fukutani, Kikuo Yamabe
2017 J jnl
Physically unclonable function using initial waveform of ring oscillators on 65 nm CMOS technology.
CoRR
Tetsufumi Tanamoto, Satoshi Takaya, Nobuaki Sakamoto, Hirotsugu Kasho, Shinichi Yasuda, Takao Marukame, Shinobu Fujita, Yuichiro Mitani
2015 — conf
Simple technique for prediction of breakdown voltage of ultrathin gate insulator under ESD testing.
ICICDT
Yuichiro Mitani, Kazuya Matsuzawa
2013 — conf
Improvement of gate disturb degradation in SONOS FETs for Vth mismatch compensation in CMOS analog circuits.
ICICDT
Masamichi Suzuki, Atsuhiro Kinoshita, Yuichiro Mitani
2013 J jnl
Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing.
Microelectron. Reliab.
Izumi Hirano, Yasushi Nakasaki, Shigeto Fukatsu, Masakazu Goto, Koji Nagatomo, Seiji Inumiya, Katsuyuki Sekine, Yuichiro Mitani, Kikuo Yamabe
2012 — conf
Lifetime prediction of channel hot carrier degradation in pMOSFETs separating NBTI component.
ICICDT
Yuichiro Mitani, Shigeto Fukatsu, Daisuke Hagishima, Kazuya Matsuzawa