| Year | Rank | Type | Title / Venue / Authors |
|---|---|---|---|
| 2024 | J | jnl |
Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction.
Adv. Artif. Intell. Mach. Learn.
|
| 2024 | J | jnl |
Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction.
CoRR
|
| 2020 | J | jnl |
Signal Process.
|
| 2020 | — | conf |
ICM
|
| 2019 | J | jnl |
Microelectron. J.
|
| 2019 | J | jnl |
Wirel. Networks
|
| 2018 | J | jnl |
IET Image Process.
|
| 2017 | — | conf |
ICM
|
| 2016 | B | conf |
ICIP
|
| 2016 | J | jnl |
Int. J. Model. Identif. Control.
|
| 2015 | J | jnl |
Int. J. Model. Identif. Control.
|
| 2015 | J | jnl |
Microelectron. J.
|
| 2014 | J | jnl |
Microprocess. Microsystems
|
| 2012 | — | conf |
NoCArc@MICRO
|
| 2004 | A | conf |
INTERSPEECH
|