Lars Liebmann

15 papers A* 2A 4Journal 4Unranked 5
YearRankTypeTitle / Venue / Authors
2015 A* conf
Pushing multiple patterning in sub-10nm: are we ready?
DAC
David Z. Pan, Lars Liebmann, Bei Yu, Xiaoqing Xu, Yibo Lin
2015 — conf
Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line.
ACM Great Lakes Symposium on VLSI
Wei Ye, Bei Yu, David Z. Pan, Yongchan Ban, Lars Liebmann
2014 A conf
Sub-20 nm design technology co-optimization for standard cell logic.
ICCAD
Kaushik Vaidyanathan, Lars Liebmann, Andrzej J. Strojwas, Larry T. Pileggi
2013 J jnl
A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial].
IEEE Des. Test
Lars Liebmann, J. Andres Torres
2013 J jnl
Layout Decomposition and Legalization for Double-Patterning Technology.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta
2011 A conf
A framework for double patterning-enabled design.
ICCAD
Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta
2011 — conf
Coupling timing objectives with optical proximity correction for improved timing yield.
ISQED
Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky
2010 J jnl
Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler
2008 A conf
Electrically driven optical proximity correction based on linear programming.
ICCAD
Shayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky
2007 — conf
Rules vs tools: what's the right way to address IC manufacturing complexity?
ISPD
Louis Scheffer, Lars Liebmann, Riko Rakojcic, David White
2003 — conf
Layout impact of resolution enhancement techniques: impediment or opportunity?
ISPD
Lars Liebmann
2002 A conf
CAD computation for manufacturability: can we save VLSI technology from itself?
ICCAD
Mark A. Lavin, Lars Liebmann
2001 — conf
Application of automated design migration to alternating phase shift mask design.
ISPD
Fook-Luen Heng, Lars Liebmann, Jennifer Lund
2001 A* conf
Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking.
DAC
Lars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur
2001 J jnl
TCAD development for lithography resolution enhancement.
IBM J. Res. Dev.
Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham