Byungwhan Kim

16 papers B 2Journal 10Unranked 4
YearRankTypeTitle / Venue / Authors
2013 J jnl
Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing.
Expert Syst. Appl.
Young-Seon Jeong, Byungwhan Kim, Young-Don Ko
2012 J jnl
Design and VLSI implementation of a high-performance face detection engine.
Comput. Electr. Eng.
Dongil Han, Jongho Choi, Byungwhan Kim, Jae Il Cho
2012 J jnl
Use of neural network to in situ conditioning of semiconductor plasma processing equipment.
Appl. Soft Comput.
Byungwhan Kim, Daehyun Kim
2011 J jnl
Neural network modeling of inter-characteristics of silicon nitride film deposited by using a plasma-enhanced chemical vapor deposition.
Expert Syst. Appl.
Su Jin Lee, Byungwhan Kim, Sung Wook Baik
2011 J jnl
Wavelet-coupled backpropagation neural network as a chamber leak detector of plasma processing equipment.
Expert Syst. Appl.
Byungwhan Kim, Sanghee Kwon
2010 J jnl
Optimization of optical lens-controlled scanning electron microscopic resolution using generalized regression neural network and genetic algorithm.
Expert Syst. Appl.
Byungwhan Kim, Sanghee Kwon, Donghwan Kim
2009 J jnl
Modeling of Thin Film Process Data Using a Genetic Algorithm-Optimized Initial Weight of Backpropagation Neural Network.
Appl. Artif. Intell.
Byungwhan Kim, Hwajune Lee, Donghwan Kim
2009 J jnl
Use of adaptive network fuzzy inference system to predict plasma charging damage on electrical MOSFET properties.
Expert Syst. Appl.
Byungwhan Kim, Hee Ju Kwon, Seongjin Choi
2009 J jnl
Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment.
Expert Syst. Appl.
Byungwhan Kim, Jeong Kim, Seongjin Choi
2007 — conf
Adaptive Network-Based Fuzzy Inference Model of Plasma Enhanced Chemical Vapor Deposition Process.
ISNN (1)
Byungwhan Kim, Seongjin Choi
2006 B conf
Diagnosis Model of Radio Frequency Impedance Matching in Plasma Equipment by Using Neural Network and Wavelets.
PRICAI
Byungwhan Kim, Jae Young Park, Donghwan Kim, Seung Soo Han
2006 B conf
Neural Network Recognition of Scanning Electron Microscope Image for Plasma Diagnosis.
PRICAI
Byungwhan Kim, Wooram Ko, Seung Soo Han
2006 — conf
Prediction of Plasma Enhanced Deposition Process Using GA-Optimized GRNN.
ISNN (2)
Byungwhan Kim, Dukwoo Lee, Seung Soo Han
2006 — conf
Prediction of Radio Frequency Impedance Matching in Plasma Equipment Using Neural Network.
ISNN (2)
Byungwhan Kim, Donghwan Kim, Seung Soo Han
2006 — conf
Recognition of Plasma-Induced X-Ray Photoelectron Spectroscopy Fault Pattern Using Wavelet and Neural Network.
ISNN (2)
Byungwhan Kim, Sooyoun Kim, Sang Jeen Hong
2002 J jnl
Fuzzy Logic Model of Langmuir Probe Discharge Data.
Comput. Chem.
Byungwhan Kim, Jang-Hyun Park, Beom-Soo Kim