Andrew R. Neureuther

14 papers A* 1Journal 9Unranked 3
YearRankTypeTitle / Venue / Authors
2010 — conf
Parameter-specific ring oscillator for process monitoring at the 45 nm node.
CICC
Lynn T.-N. Wang, Nuo Xu, Seng Oon Toh, Andrew R. Neureuther, Tsu-Jae King Liu, Borivoje Nikolic
2008 — conf
Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner.
ISQED
Jae-Seok Yang, Andrew R. Neureuther
2004 — conf
A Pattern Matching System for Linking TCAD and EDA.
ISQED
Frank Gennari, Andrew R. Neureuther
1995 J jnl
Massively parallel electromagnetic simulation for photolithographic applications.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Alfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther
1994 J jnl
Algorithms for simulation of three-dimensional etching.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Kenny K. H. Toh, Andrew R. Neureuther, Edward W. Scheckler
1994 J jnl
Models and algorithms for three-dimensional topography simulation with SAMPLE-3D.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Edward W. Scheckler, Andrew R. Neureuther
1993 J jnl
An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Edward W. Scheckler, Nelson N. Tam, Anton K. Pfau, Andrew R. Neureuther
1992 J jnl
A utility-based integrated system for process simulation.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Edward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton
1991 A* conf
Linking TCAD to EDA - Benefits and Issues.
DAC
Goodwin R. Chin, Walter C. Dietrich Jr., Duane S. Boning, Alexander S. Wong, Andrew R. Neureuther, Robert W. Dutton
1991 J jnl
Massively parallel algorithms for scattering in optical lithography.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Roberto Guerrieri, Karim H. Tadros, John K. Gamelin, Andrew R. Neureuther
1991 J jnl
The intertool profile interchange format: a technology CAD environment approach [semiconductor technology].
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Alexander S. Wong, Andrew R. Neureuther
1988 J jnl
SIMPL-2: (SIMulated Profiles from the Layout-Version 2).
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
K. Lee, Andrew R. Neureuther
1988 J jnl
Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
Roberto Guerrieri, Andrew R. Neureuther
1966 — —
Interaction of Modulated Electron Beams With Open Periodic Structures
Andrew R. Neureuther