Albena Paskaleva

16 papers Journal 16
YearRankTypeTitle / Venue / Authors
2025 J jnl
Impact of Trapped Charge on the Breakdown Phenomena in HfO
J. Circuits Syst. Comput.
Dencho Spassov, Albena Paskaleva, E. Guziewicz, Tz. Ivanov, T. Stanchev, Vojkan Davidovic, Sandra Veljkovic, Nikola Mitrovic, Danijel Dankovic
2022 J jnl
Response of Commercial P-Channel Power VDMOS Transistors to Ionizing Irradiation and Bias Temperature Stress.
J. Circuits Syst. Comput.
Sandra Veljkovic, Nikola Mitrovic, Vojkan Davidovic, Snezana Golubovic, Snezana Djoric-Veljkovic, Albena Paskaleva, Dencho Spassov, Srboljub Stankovic, Marko S. Andjelkovic, Zoran Prijic, Ivica Manic, Aneta Prijic, Goran S. Ristic, Danijel Dankovic
2018 J jnl
A review of pulsed NBTI in P-channel power VDMOSFETs.
Microelectron. Reliab.
Danijel Dankovic, Ivica Manic, Aneta Prijic, Vojkan Davidovic, Zoran Prijic, Snezana Golubovic, Snezana Djoric-Veljkovic, Albena Paskaleva, Dencho Spassov, Ninoslav Stojadinovic
2014 J jnl
Time-dependent-dielectric-breakdown characteristics of Hf-doped Ta
Microelectron. Reliab.
Elena Atanassova, Nenad Novkovski, Dencho Spassov, Albena Paskaleva, Aleksandar Skeparovski
2012 J jnl
Doped Ta
Microelectron. Reliab.
Elena Atanassova, Albena Paskaleva, Dencho Spassov
2011 J jnl
Lightly Al-doped Ta
Microelectron. Reliab.
Dencho Spassov, Elena Atanassova, Albena Paskaleva
2010 J jnl
Constant current stress-induced leakage current in mixed HfO
Microelectron. Reliab.
Elena Atanassova, Nenad Novkovski, Albena Paskaleva, Dencho Spassov
2008 J jnl
Degradation behavior of Ta
Microelectron. Reliab.
Elena Atanassova, Ninoslav Stojadinovic, Albena Paskaleva
2008 J jnl
Effects of the metal gate on the stress-induced traps in Ta
Microelectron. Reliab.
Elena Atanassova, Albena Paskaleva, Nenad Novkovski
2007 J jnl
Challenges of Ta
Microelectron. Reliab.
Elena Atanassova, Albena Paskaleva
2007 J jnl
Metal gates and gate-deposition-induced defects in Ta
Microelectron. Reliab.
Elena Atanassova, Dencho Spassov, Albena Paskaleva
2007 J jnl
Polarity asymmetry of stress and charge trapping behavior of thin Hf- and Zr-silicate layers.
Microelectron. Reliab.
Albena Paskaleva, Martin Lemberger, Anton J. Bauer
2005 J jnl
Conduction mechanisms and an evidence for phonon-assisted conduction process in thin high-k Hf
Microelectron. Reliab.
Albena Paskaleva, Anton J. Bauer, Martin Lemberger
2005 J jnl
Electrical properties of hafnium silicate films obtained from a single-source MOCVD precursor.
Microelectron. Reliab.
Martin Lemberger, Albena Paskaleva, Stefan Zürcher, Anton J. Bauer, Lothar Frey, Heiner Ryssel
2003 J jnl
Electrical characterization of zirconium silicate films obtained from novel MOCVD precursors.
Microelectron. Reliab.
Albena Paskaleva, Martin Lemberger, Stefan Zürcher, Anton J. Bauer, Lothar Frey, Heiner Ryssel
2002 J jnl
Breakdown fields and conduction mechanisms in thin Ta
Microelectron. Reliab.
Elena Atanassova, Albena Paskaleva